The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2010

Filed:

Sep. 22, 2006
Applicant:

Joerg Steinert, Jena, DE;

Inventor:

Joerg Steinert, Jena, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 3/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method for correcting control of an optical scanner in a laser scanning microscope for imaging of a sample by scanning, the microscope guiding at least one beam path section of an illumination beam path of the microscope over the sample from an illumination device to the sample and/or an imaging beam path of the microscope from the sample to an acquisition device of the microscope in order to obtain an image of the sample, generating control signals corresponding to a predefined target movement using parameters and/or a transfer function of the scanner that are used for control and/or regulation and moving the at least one beam path section in response to the control signals, whereby an image of a reference sample having predefined structures imageable by the microscope is obtained by generating control signals corresponding to a predefined target test movement and moving the at least one beam path section in response to the control signals, thereby obtaining the image. From the image thereby obtained, a deviation in the actual positions of the predefined structures of the reference sample from the predefined target positions is determined and the transfer function or parameters are corrected as a function of the deviations at least one of the parameters used for control and/or regulation, so that when using the corrected parameter for control or regulation and/or when using the corrected transfer function, the deviation in the actual position of at least one of the structures from the target position of the structure is reduced.


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