The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 16, 2010

Filed:

Feb. 27, 2007
Applicants:

Katsuhiro Okada, Irabaki, JP;

Seishi Suzuki, Ibaraki, JP;

Yasuyuki Sasaki, Ibaraki, JP;

Yuko Ueda, Ibaraki, JP;

Toshiyuki Yoshikawa, Ibaraki, JP;

Inventors:

Katsuhiro Okada, Irabaki, JP;

Seishi Suzuki, Ibaraki, JP;

Yasuyuki Sasaki, Ibaraki, JP;

Yuko Ueda, Ibaraki, JP;

Toshiyuki Yoshikawa, Ibaraki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
A61F 15/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention relates to a film base material for an adhesive skin patch, which includes an elastomer film unevenly having unevenness on at least one surface thereof, in which, in one unevenness in which the distance perpendicular to the surface of the elastomer film between the top of the unevenness and the bottom thereof is the longest among the plurality of unevenness, the distance is within the range of from 1 to 5 μm; in another unevenness in which the distance perpendicular to the surface of the elastomer film between the top of the unevenness and the bottom thereof is the shortest among the plurality of unevenness, the distance is within the range of from 0.1 to 0.9 μm; and the 10-point average roughness of the surface is within the range of from 0.5 μm to 3 μm, and which is decreased in glossy texture on the surface thereof and inconspicuous when it is applied to the skin or the like; and the adhesive skin patch including the film base material.


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