The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Mar. 22, 2005
Anil S. Bhanap, Milpitas, CA (US);
Robert R. Roth, Sunnyvale, CA (US);
Kikue S. Burnham, San Ramon, CA (US);
Brian J. Daniels, La Honda, CA (US);
Denis H. Endisch, Cupertino, CA (US);
Ilan Golecki, Parsippany, NJ (US);
Anil S. Bhanap, Milpitas, CA (US);
Robert R. Roth, Sunnyvale, CA (US);
Kikue S. Burnham, San Ramon, CA (US);
Brian J. Daniels, La Honda, CA (US);
Denis H. Endisch, Cupertino, CA (US);
Ilan Golecki, Parsippany, NJ (US);
Honeywell International, Inc., Morristown, NJ (US);
Abstract
The invention concerns a method for applying a surface modification agent composition for organosilicate glass dielectric films. More particularly, the invention pertains to a method for treating a silicate or organosilicate dielectric film on a substrate, which film either comprises silanol moieties or has had at least some previously present carbon containing moieties removed therefrom. The treatment adds carbon containing moieties to the film and/or seals surface pores of the film, when the film is porous.