The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Oct. 30, 2007
Shin-ichi Uehara, Tokyo, JP;
Yuko Sato, Tokyo, JP;
Ken Sumiyoshi, Tokyo, JP;
Setsuo Kaneko, Tokyo, JP;
Jin Matsushima, Tokyo, JP;
Shin-Ichi Uehara, Tokyo, JP;
Yuko Sato, Tokyo, JP;
Ken Sumiyoshi, Tokyo, JP;
Setsuo Kaneko, Tokyo, JP;
Jin Matsushima, Tokyo, JP;
NEC Corporation, Tokyo, JP;
Abstract
In a formation method for forming a fine structure in a workpiece () containing an etching control component, using an isotropic etching process, a mask () having an opening () is applied to the workpiece, and the workpiece is etched with an etching solution () to thereby form a recess (), corresponding to a shape of the opening, in a surface of the workpiece. The etching of the workpiece is stopped due to the etching control component eluted out of the workpiece in the etching solution within the recess during the isotropic etching process.