The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 16, 2010
Filed:
Jan. 26, 2005
Tooru Hachisuka, Ushiku, JP;
Shigenobu Yoshida, Tokyo, JP;
Chiharu Okawara, Toride, JP;
Yoshinori Kobayashi, Tsukuba, JP;
Kenji Ito, Tsukuba, JP;
Hisashi Togashi, Tsukuba, JP;
Kouichi Hirata, Tsukuba, JP;
Tooru Hachisuka, Ushiku, JP;
Shigenobu Yoshida, Tokyo, JP;
Chiharu Okawara, Toride, JP;
Yoshinori Kobayashi, Tsukuba, JP;
Kenji Ito, Tsukuba, JP;
Hisashi Togashi, Tsukuba, JP;
Kouichi Hirata, Tsukuba, JP;
Mitsubishi Plastics, Inc., Tokyo, JP;
Abstract
The gas barrier film of the present invention is a gas barrier film comprising a base material, and an inorganic thin film composed of a silicon oxide film formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide film observed by an electron spin resonance method (ESR method) is from 1×10to 1×10spins/cm, or a gas barrier film comprising a base material, an inorganic thin film containing silicon oxide and the other metal component formed on one or both surfaces of the base material, wherein radical density of the Pb center of the silicon oxide in the inorganic thin film observed by an ESR method is from 13×10to 3×10spins/mol, and a laminate wherein at least one paper and/or plastic film is laminated on the gas barrier film.