The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7678196 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 16, 2010

Filed:

Aug. 26, 2004
Applicants:

Paul August M. Lindelauf, Veldhoven, NL;

Marinus Franciscus J. Evers, Heeze, NL;

Inventors:
Assignee:

OTB Solar B.V., Eindhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system for treating substrates, provided with at least one processing chamber to treat at least one substrate with a vacuum process, wherein said processing chamber is provided with a substrate access closable by a closing body, wherein the system is provided with a conveying device which is at least arranged to move said closing body, wherein said conveying device is arranged to convey a mask, intended to at least partly cover said substrate during said vacuum process, at least between a position outside the processing chamber and a position inside the processing chamber. It is advantageous when at least said substrate holder is provided with positioning means to position the substrate holder and the mask relative to each other. The invention further provides a use of such a system.


Find Patent Forward Citations

Lindelauf, Paul August M.. (2010). System and method for treating substrates (U.S. Patent No. 7678196). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7678196

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