The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7676904 B1

PDF
Full Text
Expired
Date of Patent:
Mar. 16, 2010

Filed:

Jul. 30, 2004
Applicants:

Phong V. Chau, San Jose, CA (US);

James Mac Freitag, Sunnyvale, CA (US);

Mustafa Michael Pinarbasi, Morgan Hill, CA (US);

Hua Ai Zeng, San Jose, CA (US);

Inventors:

Phong V. Chau, San Jose, CA (US);

James Mac Freitag, Sunnyvale, CA (US);

Mustafa Michael Pinarbasi, Morgan Hill, CA (US);

Hua Ai Zeng, San Jose, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G11B 5/127 (2006.01); C23C 14/34 (2006.01);
U.S. Cl.
CPC ...
Abstract

A method of manufacturing a GMR, TMR or CPP GMR sensor having a smooth interface between magnetic and non-magnetic layers to improve sensor performance by exposing a layer to a low energy ion beam prior to depositing a subsequent layer.


Find Patent Forward Citations

Chau, Phong. (2010). Method of manufacturing high sensitivity spin valve designs with ion beam treatment (U.S. Patent No. 7676904). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7676904

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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