The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Jun. 05, 2006
Xiao Yang, Cupertino, CA (US);
Yuxiang Wang, Palo Alto, CA (US);
Wook Ji, San Jose, CA (US);
Justin Allen Payne, San Jose, CA (US);
YE Wang, Santa Clara, CA (US);
Howard Woo, San Jose, CA (US);
Xiao Yang, Cupertino, CA (US);
Yuxiang Wang, Palo Alto, CA (US);
Wook Ji, San Jose, CA (US);
Justin Allen Payne, San Jose, CA (US);
Ye Wang, Santa Clara, CA (US);
Howard Woo, San Jose, CA (US);
Miradia Inc., Santa Clara, CA (US);
Abstract
A method for forming an optical deflection device includes providing a semiconductor substrate comprising an upper surface region and a plurality of drive devices within one or more portions of the semiconductor substrate. The upper surface region includes one or more patterned structure regions and at least one open region to expose a portion of the upper surface region to form a resulting surface region. The method also includes forming a planarizing material overlying the resulting surface region to fill the at least one open region and cause formation of an upper planarized layer using the fill material. The method further includes forming a thickness of silicon material at a temperature of less than 300 ° C. to maintain a state of the planarizing material.