The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Oct. 24, 2005
Yukio Taniguchi, Yokohama, JP;
Yukio Taniguchi, Yokohama, JP;
Kabushiki Kaisha Ekisho Sentan Gijutsu Kaihatsu Center, Yokohama-Shi, Kanagawa-ken, JP;
Abstract
An apparatus for producing a hologram mask. The apparatus includes a first object light at least partially transmittable through a first original mask having a light transmitting screening pattern, and a first reference light having a first phase difference between it and the first object light. The first object and reference lights cause interference patterns to be recorded a hologram recording material, as do a second object light at least partially transmittable through a second original mask having a light transmitting screening pattern, and a second reference light having a second phase difference between it and the second object light where the second phase difference is not the same as the first phase difference. The resulting first and second original mask images recorded in the hologram recording material can be simultaneously replayed to produce an exposed pattern approximating an exposed pattern of a non-holographic phase shifting photomask.