The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Dec. 04, 2007
Nozomu Hayashi, Utsunomiya, JP;
Nozomu Hayashi, Utsunomiya, JP;
Canon Kabushiki Kaisha, , JP;
Abstract
An exposure apparatus for exposing shot areas on a substrate comprises a measuring device configured to measure a position of an alignment mark in each of the shot areas on the substrate, and a controller configured to generate sample shot sets from the shot areas on the substrate, to cause the measuring device to measure the position of the alignment mark in each of the sample shot sets under each of measurement conditions, to calculate a shot arrangement based on the measured positions with respect to each of combinations of the measurement conditions and the sample shot sets, to calculate a variation of the shot arrangements calculated with respect to the sample shot sets with respect to each of the measurement conditions, and to display the variation calculated with respect to each of the measurement conditions.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile