The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Aug. 02, 2005
Norman W. Johnston, Perrysburg, OH (US);
Kenneth R. Kormanyos, Berkey, OH (US);
Nicholas A. Reiter, Gibsonburg, OH (US);
Norman W. Johnston, Perrysburg, OH (US);
Kenneth R. Kormanyos, Berkey, OH (US);
Nicholas A. Reiter, Gibsonburg, OH (US);
Calyxo GmbH, Bitterfeld-Wolfen, DE;
Abstract
A process for coating a substrate at atmospheric pressure comprises the steps of vaporizing a controlled mass of semiconductor material at substantially atmospheric pressure within a heated inert gas stream, to create a fluid mixture having a temperature above the condensation temperature of the semiconductor material, directing the fluid mixture at substantially atmospheric pressure onto the substrate having a temperature below the condensation temperature of the semiconductor material, and depositing a layer of the semiconductor material onto a surface of the substrate.