The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 09, 2010

Filed:

Dec. 12, 2005
Applicants:

Michael J. Renn, Hudson, WI (US);

Marcelino Essien, Cedar Crest, NM (US);

Bruce H. King, Albuquerque, NM (US);

Jason A. Paulsen, Centerville, MN (US);

Inventors:

Michael J. Renn, Hudson, WI (US);

Marcelino Essien, Cedar Crest, NM (US);

Bruce H. King, Albuquerque, NM (US);

Jason A. Paulsen, Centerville, MN (US);

Assignee:

Optomec Design Company, Albuquerque, NM (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8234 (2006.01);
U.S. Cl.
CPC ...
Abstract

Method and apparatus for direct writing of passive structures having a tolerance of 5% or less in one or more physical, electrical, chemical, or optical properties. The present apparatus is capable of extended deposition times. The apparatus may be configured for unassisted operation and uses sensors and feedback loops to detect physical characteristics of the system to identify and maintain optimum process parameters.


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