The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 09, 2010
Filed:
Sep. 29, 2004
Hideo Kobayashi, Tokyo, JP;
Takao Higuchi, Tokyo, JP;
Hideo Kobayashi, Tokyo, JP;
Takao Higuchi, Tokyo, JP;
Hoya Corporation, Tokyo, JP;
Abstract
A method of producing a mask blank has a resist film forming (resist coating) process of dispensing a resist solution containing a resist material and a solvent onto a square-like substrate, and rotating the substrate to spread the dispensed resist solution over the substrate and to dry the resist solution on the substrate, thereby forming a resist film on the substrate. While the substrate is rotated in the resist film forming (resist coating) process, an exhausting member performs an exhausting operation to cause an airflow along an upper surface of the substrate from the center of the substrate towards an outer peripheral portion of the substrate so that a puddle of the resist solution formed at a peripheral end portion of the substrate is prevented from being moved towards the center of the substrate by the rotation of the substrate.