The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Mar. 09, 2005
Byung-cheol Lee, Daejeon, KR;
Young-kyung Lim, Daejeon, KR;
Young-hwan Han, Daejeon, KR;
Young-uk Jung, Daejeon, KR;
Seong-hee Park, Daejeon, KR;
Cheol-jin Lee, Seoul, KR;
Tae-jae Lee, Choongchunbook-do, KR;
Byung-Cheol Lee, Daejeon, KR;
Young-Kyung Lim, Daejeon, KR;
Young-Hwan Han, Daejeon, KR;
Young-Uk Jung, Daejeon, KR;
Seong-Hee Park, Daejeon, KR;
Cheol-Jin Lee, Seoul, KR;
Tae-Jae Lee, Choongchunbook-do, KR;
Abstract
An electron beam irradiator capable of performing electron beam irradiation in a wide area at a high current density with a field emitter tip. The electron beam irradiator comprises: a vacuum chamber having a beam irradiation window formed longitudinally in an outer periphery of the vacuum chamber; a cathode placed centrally and longitudinally inside the vacuum chamber, and having a field emitter tip formed on the cathode, corresponding to the beam irradiation window; and a high voltage supply placed at one end of the vacuum chamber, and adapted to apply high voltage toward the cathode. The electron beam irradiation can be made in a wide area without using an electromagnet as well as in a high current density without using a heater such as a filament or an additional power supply, thereby to ensure a simplified structure as well as a reduced size.