The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 02, 2010
Filed:
Dec. 26, 2007
Hyung-jin Park, Seoul, KR;
Hyung-Jin Park, Seoul, KR;
Dongbu HiTek Co., Ltd., Seoul, KR;
Abstract
A capacitor can prevent a problem of step coverage in semiconductor device, caused by a thickness of an insulator film and an upper metal film included a metal-insulator-metal (MIM) capacitor, between the MIM capacitor region and its circumferential region. A capacitor in a semiconductor device includes a first metal film provided with a recess having a predetermined depth over a semiconductor substrate. An insulator film and a second metal film may be formed in the recess with a thickness corresponding to a depth of the recess. The insulator and second metal films are disconnected from an inner lateral side of the recess. A dielectric film including a plurality of plugs is in contact with the first and second metal films and the insulator film. A plurality of metal electrodes is in contact with the plugs over the dielectric film.