The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2010

Filed:

Jun. 25, 2001
Applicants:

Tony S. Kaushal, Cupertino, CA (US);

You Wang, Cupertino, CA (US);

Ananda H. Kumar, Fremont, CA (US);

Inventors:

Tony S. Kaushal, Cupertino, CA (US);

You Wang, Cupertino, CA (US);

Ananda H. Kumar, Fremont, CA (US);

Assignee:

Applied Materials, Inc., Santa Clara, CA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 15/04 (2006.01); B32B 9/00 (2006.01); C23C 16/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An erosion-resistant article for use as a component in plasma process chamber. The erosion-resistant article comprises a support and an oxide coating comprising yttrium, which is disposed over the support. The support and the oxide coating preferably have material compositions that differ from one another in coefficient of thermal expansion by no more than 5×10/K. Preferred oxide coating compositions include yttria and yttrium aluminum garnet. Preferred supports include alumina supports and aluminum-silicon carbide supports.


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