The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 02, 2010

Filed:

Feb. 23, 2006
Applicant:

Klony Lieberman, Jerusalem, IL;

Inventor:

Klony Lieberman, Jerusalem, IL;

Assignee:

VKB Inc., Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 21/14 (2006.01);
U.S. Cl.
CPC ...
Abstract

A pattern projector including a source of light to be projected, a spatial light modulator arranged in a spatial light modulator plane, the spatial light modulator receiving the light from the source of light and being configured to pass the light therethrough in a first pattern and projection optics receiving the light from the spatial light modulator and being operative to project a desired second pattern onto a projection surface lying in a projection surface plane which is angled with respect to the spatial light modulator plane, the first pattern being a distortion of the desired second pattern configured such that keystone distortions resulting from the difference in angular orientations of the spatial light modulator plane and the projection surface plane are compensated.


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