The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Mar. 18, 2008
Takeshi Ito, Yokkaichi, JP;
Satoshi Tanaka, Kawasaki, JP;
Toshiya Kotani, Machida, JP;
Tadahito Fujisawa, Yokkaichi, JP;
Koji Hashimoto, Yokohama, JP;
Takeshi Ito, Yokkaichi, JP;
Satoshi Tanaka, Kawasaki, JP;
Toshiya Kotani, Machida, JP;
Tadahito Fujisawa, Yokkaichi, JP;
Koji Hashimoto, Yokohama, JP;
Kabushiki Kaisha Toshiba, Tokyo, JP;
Abstract
A pattern creation method, including laying out data of a most extreme end pattern of integrated circuit patterns on a first layer and laying out data of the integrated circuit patterns excluding the most extreme end pattern on a second layer, extracting data of a first most proximate pattern being most proximate to the most extreme end pattern from the second layer and converting the extracted data to a third layer, generating data of a contacting pattern which contacts both the first most proximate pattern and the most extreme end pattern in a fourth layer, generating data of a non-overlapping pattern of the contacting pattern excluding overlapping portions with the most extreme end pattern and the first most proximate pattern in a fifth layer, extracting data of a second most proximate pattern being most proximate to the non-overlapping pattern and converting the extracted data to the first layer.