The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2010

Filed:

May. 14, 2007
Applicants:

Liang Tang, Waukesha, WI (US);

Philippe Ernest, Gif sur Yvette, FR;

Georges-william Baptiste, Buc, FR;

Fengfeng Tao, Clifton Park, NY (US);

Inventors:

Liang Tang, Waukesha, WI (US);

Philippe Ernest, Gif sur Yvette, FR;

Georges-William Baptiste, Buc, FR;

Fengfeng Tao, Clifton Park, NY (US);

Assignee:

General Electric Co., Schenectady, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05G 1/10 (2006.01);
U.S. Cl.
CPC ...
Abstract

A system and method to improve the high voltage performance of an x-ray tube with electrostatic deflection of an electron beam focal spot. The system and method provides protection of bias circuits from high voltage transients and spit protection in x-ray tubes through the use of a high voltage transient suppression and spit protection circuit assembly coupled between the bias circuits of a high voltage generator and an x-ray tube vacuum housing of an x-ray generation system.


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