The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2010

Filed:

Aug. 09, 2005
Applicants:

Koji Kaise, Kumagaya, JP;

Toru Fujii, Hiki-gun, JP;

Yasushi Mizuno, Saitama, JP;

Inventors:

Koji Kaise, Kumagaya, JP;

Toru Fujii, Hiki-gun, JP;

Yasushi Mizuno, Saitama, JP;

Assignee:

Nikon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 21/00 (2006.01); G01J 4/00 (2006.01);
U.S. Cl.
CPC ...
Abstract

An optical property measurement apparatus is equipped with an optical system unit that selectively places an opening section for passing illumination light, a microlens array for measuring wavefront aberration, and a polarization detection system for measuring a polarization state of the illumination light on an optical path of the illumination light. Accordingly an illumination shape and a size of an illumination optical system, wavefront aberration of a projection optical system and a polarization state of the illumination light can be measured together. Therefore, for example, even when exposure is performed with polarized illumination that is a type of modified illumination, highly-accurate exposure can be achieved by adjusting various optical systems based on the measurement results.


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