The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
May. 17, 2006
Dong-wook Lee, Daejeon, KR;
Yeon-keun Lee, Deajeon, KR;
In-seok Hwang, Daejeon, KR;
Seung-wook Kim, Incheon, KR;
Dong-wook Lee, Daejeon, KR;
Yeon-keun Lee, Deajeon, KR;
In-seok Hwang, Daejeon, KR;
Seung-wook Kim, Incheon, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
The present invention relates to a PDP filter and a manufacturing method thereof using a fully etched electromagnetic interference film, and more particularly, to a PDP filter and a manufacturing method thereof in which the separation between an etching portion and a non-etching portion is removed by etching an entire surface of electromagnetic interference film that has been used by selectively etching a predetermined region on a surface to form an effective screen portion (etching portion) separately from a ground portion (non-etching portion), and when an electromagnetic interference film roll having such a structure is cut into a small size in a winding direction of the roller only it can be laminated with other functional films by a roll-to-roll process so as to make it applicable when required by cutting it into a desired size even though the effective size of a PDP is changed.