The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Jul. 21, 2005
Joerg Muchow, Reutlingen, DE;
Torsten Ohms, Gerlingen, DE;
Volkmar Senz, Metzingen, DE;
Guenther-nino-carlo Ullrich, Reutlingen, DE;
Ronald Gampp, Reutlingen, DE;
Joerg Muchow, Reutlingen, DE;
Torsten Ohms, Gerlingen, DE;
Volkmar Senz, Metzingen, DE;
Guenther-Nino-Carlo Ullrich, Reutlingen, DE;
Ronald Gampp, Reutlingen, DE;
Robert Bosch GmbH, Stuttgart, DE;
Abstract
A method and a micromechanical component which counteract manufacturing-process-related mechanical stresses in the membrane are provided. The membrane is formed on a substrate in a layer system and spans a cavity in the substrate. The layer system includes at least one base layer formed on the substrate for circuit elements. At least one structured masking layer is also formed on the base layer for defining the circuit elements. The masking layer is structured in the area of the membrane in such a way that mechanical stresses acting in the area of the membrane under vacuum are at least partially compensated, the intrinsic stress of the masking layer being taken into account in the layout of the structuring.