The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Feb. 13, 2008
Sajan Marokkey, Wappingers Falls, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Klaus Herold, Poughquag, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Sajan Marokkey, Wappingers Falls, NY (US);
Alois Gutmann, Poughkeepsie, NY (US);
Klaus Herold, Poughquag, NY (US);
Chandrasekhar Sarma, Poughkeepsie, NY (US);
Infineon Technologies AG, Neubiberg, DE;
Abstract
Methods of patterning features of semiconductor devices and methods of processing and fabricating semiconductor devices are disclosed. In one embodiment, a method of processing a semiconductor device includes forming first sidewall spacers on a first hard mask, removing the first hard mask, and forming a first material layer over the first sidewall spacers. A second hard mask is formed over the first material layer and the first sidewall spacers. Second sidewall spacers are formed on the second hard mask, and the second hard mask is removed. At least the first sidewall spacers are patterned using the second sidewall spacers as a mask.