The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 23, 2010
Filed:
Jan. 19, 2007
Stephan Kudelka, Dresden, DE;
Lars Oberbeck, Dresden, DE;
Uwe Schroeder, Dresden, DE;
Tim Boescke, Hamburg, DE;
Johannes Heitmann, Dresden, DE;
Annette Saenger, Dresden, DE;
Joerg Schumann, Dresden, DE;
Elke Erben, Dresden, DE;
Stephan Kudelka, Dresden, DE;
Lars Oberbeck, Dresden, DE;
Uwe Schroeder, Dresden, DE;
Tim Boescke, Hamburg, DE;
Johannes Heitmann, Dresden, DE;
Annette Saenger, Dresden, DE;
Joerg Schumann, Dresden, DE;
Elke Erben, Dresden, DE;
Qimonda AG, Munich, DE;
Abstract
The present invention relates to a method for depositing a dielectric material comprising a transition metal compound. After providing a substrate, a first pre-cursor comprising a transition metal compound and a second pre-cursor predominantly comprising at least one of water vapour, ammonia and hydrazine are successively applied on the substrate for forming a first layer of transition metal containing material. In a next step the first pre-cursor and a third pre-cursor comprising at least one of ozone and oxygen are successively applied on the first layer for forming a second layer of the transition metal containing material.