The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 23, 2010

Filed:

Nov. 18, 2005
Applicants:

Xiangdong Feng, Upland, CA (US);

Yie-shein Her, Canandaigua, NY (US);

Yi Yang, Broadview Heights, OH (US);

Inventors:

Xiangdong Feng, Upland, CA (US);

Yie-Shein Her, Canandaigua, NY (US);

Yi Yang, Broadview Heights, OH (US);

Assignee:

Ferro Corporation, Cleveland, OH (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C09K 3/14 (2006.01); C09G 1/02 (2006.01); C01F 17/00 (2006.01); C01B 15/04 (2006.01);
U.S. Cl.
CPC ...
Abstract

The present invention provides a method of synthesizing abrasive particles and methods of using the same in chemical mechanical polishing slurry applications. The nanosized abrasive particles according to the invention are produced by hydrothermal synthesis using an insoluble source of cerium. The crystallites of the particles include cerium ions and titanium ions.


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