The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Apr. 09, 2004
Applicants:
Tadahiro Ohmi, Sendai-shi, Miyagi, 980-0813, JP;
Shigetoshi Sugawa, Miyagi, JP;
Kimio Yanagida, Fukushima, JP;
Kiwamu Takehisa, Miyagi, JP;
Inventors:
Tadahiro Ohmi, Sendai-shi, Miyagi, 980-0813, JP;
Shigetoshi Sugawa, Miyagi, JP;
Kimio Yanagida, Fukushima, JP;
Kiwamu Takehisa, Miyagi, JP;
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
In a pattern writing method for writing a pattern on a substrate by the use of projection patterns output from a mirror device including two-dimensionally arranged micromirrors, exposure is implemented by ON/OFF controlling each micromirror and partly overlapping the projection patterns from the mirror device at least in a one-dimensional direction, thereby accurately controlling the exposure of intermediate amounts of light.