The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Aug. 11, 2005
John Sved, D-27755 Delmenhorst, DE;
John Sved, D-27755 Delmenhorst, DE;
Other;
Abstract
The invention relates to the fact that a common industrial neutron interrogation screening requirement is that a high throughput rate be accommodated by the screening system. The accumulation of elemental abundance ratio spectral data to minimize statistical uncertainty is a function of the neutron flux passing through the subject. If the subject passes through a neutron beam, with a strictly limited time window for exposure, the flux must be sufficient to accumulate the required statistics. The level of neutron flux necessary may exceed the cost effective limits of the selected neutron source means. Exposure time window dilation is disclosed through a class of system configurations which become practical for reduction to practice by utilization of linear neutron source topology neutron generators. This disclosure is concerned with example embodiments which utilize the length, width, thickness and segmentation of the source emission zone within an appropriate neutron source.