The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Feb. 01, 2006
David D. Nolte, Lafayette, IN (US);
Leilei Peng, West Lafayette, IN (US);
Fred E. Regnier, West Lafayette, IN (US);
Ming Zhao, West Lafayette, IN (US);
David D. Nolte, Lafayette, IN (US);
Leilei Peng, West Lafayette, IN (US);
Fred E. Regnier, West Lafayette, IN (US);
Ming Zhao, West Lafayette, IN (US);
Purdue Research Foundation, West Lafayette, IN (US);
Abstract
A phase contrast quadrature interferometric method and apparatus for determining the presence or absence of a target analyte in a sample. The method includes probing a substrate exposed to the sample with a laser beam. The substrate includes a reflecting surface with a first region having recognition molecules specific to the target analyte and a second region without recognition molecules. The method also includes probing the first and second region, and measuring time dependent intensity on a photodetector at one or both of a pair of quadrature angles of a reflected diffraction signal. The apparatus includes a laser source, a platform for receiving the planar array, an objective lens offset from the platform by approximately a focal length, and a split photodetector means for measuring a first quadrature and a second quadrature in a signal resulting from reflection of the laser beam.