The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Aug. 12, 2002
Michael J. Haji-sheikh, Dekalb, IL (US);
James R. Biard, Richardson, TX (US);
James K. Guenter, Garland, TX (US);
Bobby M. Hawkins, Wylie, TX (US);
Michael J. Haji-Sheikh, Dekalb, IL (US);
James R. Biard, Richardson, TX (US);
James K. Guenter, Garland, TX (US);
Bobby M. Hawkins, Wylie, TX (US);
Finisar Corporation, Sunnyvale, CA (US);
Abstract
Disclosed are methods for providing wafer photonic flow control to a semiconductor wafer () having a substrate (), at least one active layer () and at least one surface layer (). Photonic flow control can be achieved through the formation of trenches () and/or insulating implants () formed in said wafer (), whereby active regions () are defined by trenches () that operate as nonconductive areas (). Methods of and systems for wafer level burn-in (WLBI) of semiconductor devices are also disclosed. Photonic flow control at the wafer level is important when using WLBI methods and systems.