The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Jan. 30, 2006
Applicants:
Eishi Shiobara, Yokohama, JP;
Takehiro Kondoh, Yokohama, JP;
Yuji Kobayashi, Yokohama, JP;
Koutarou Sho, Yokohama, JP;
Inventors:
Eishi Shiobara, Yokohama, JP;
Takehiro Kondoh, Yokohama, JP;
Yuji Kobayashi, Yokohama, JP;
Koutarou Sho, Yokohama, JP;
Assignee:
Kabushiki Kaisha Toshiba, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
Abstract
A pattern forming method includes the following steps. A resist pattern is formed on a to-be-processed film. A mask pattern including the resist pattern and a resin film formed on a surface of the resist pattern is formed. Slimming of the mask pattern is executed.