The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Nov. 14, 2005
Raj D. Patel, Oakville, CA;
David J. Sanders, Oakville, CA;
T Hwee NG, Mississauga, CA;
Stephan V. Drappel, Toronto, CA;
Sandra J. Gardner, Oakville, CA;
Sonja Hadzidedic, Etobicoke, CA;
Timothy L. Lincoln, Rochester, NY (US);
Kevin F. Marcell, Rochester, NY (US);
Louis V. Isganitis, Rochester, NY (US);
Raj D. Patel, Oakville, CA;
David J. Sanders, Oakville, CA;
T Hwee Ng, Mississauga, CA;
Stephan V. Drappel, Toronto, CA;
Sandra J. Gardner, Oakville, CA;
Sonja Hadzidedic, Etobicoke, CA;
Timothy L. Lincoln, Rochester, NY (US);
Kevin F. Marcell, Rochester, NY (US);
Louis V. Isganitis, Rochester, NY (US);
Xerox Corporation, Norwalk, CT (US);
Abstract
Embodiments include a distilled wax having a crystallinity of from about 55 to about 100 percent, wherein the degree of crystallinity is calculated using the following formulas: [Heat of enthalpy (Hm) J/g/294 J/g]×100=degree of crystallinity (Xc); [Heat of recrystallization (Hrc) J/g/294 J/g]×100=degree of crystallinity (Xc); and Sc/(Sc+Sa)]×100%, wherein Sc is a diffraction peak area of a crystalline component of the wax and the Sa is a diffraction peak area of an amorphous component of the wax; and wherein the Mp, Mn and Mw of the wax are all within the range of from about 500 to about 800, and wherein the wax has a polydispersity of from about 1 to about 1.05.