The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 16, 2010
Filed:
Mar. 27, 2007
Applicant:
Jacques Schmitt, La Ville du Bois, FR;
Inventor:
Jacques Schmitt, La Ville du Bois, FR;
Assignee:
Oerlikon Solar IP AG, Truebbach, Truebbach, CH;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/505 (2006.01);
U.S. Cl.
CPC ...
Abstract
A radiofrequency plasma reactor () for the treatment of substantially large sized substrates is disclosed, comprising between the electrodes () of the plasma reactor a solid or gaseous dielectric layer () having a non planar-shaped surface-profile, said profile being defined for compensating a process non uniformity in the reactor or generating a given distribution profile.