The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2010
Filed:
Aug. 18, 2006
Chengbin Qiu, Cupertino, CA (US);
Teruo Sasagawa, Los Gatos, CA (US);
Ming-hau Tung, San Francisco, CA (US);
Chun-ming Wang, Fremont, CA (US);
Stephen Zee, San Jose, CA (US);
Chengbin Qiu, Cupertino, CA (US);
Teruo Sasagawa, Los Gatos, CA (US);
Ming-Hau Tung, San Francisco, CA (US);
Chun-Ming Wang, Fremont, CA (US);
Stephen Zee, San Jose, CA (US);
QUALCOMM MEMS Technologies, Inc., San Diego, CA (US);
Abstract
Certain MEMS devices include layers patterned to have tapered edges. One method for forming layers having tapered edges includes the use of an etch leading layer. Another method for forming layers having tapered edges includes the deposition of a layer in which the upper portion is etchable at a faster rate than the lower portion. Another method for forming layers having tapered edges includes the use of multiple iterative etches. Another method for forming layers having tapered edges includes the use of a liftoff mask layer having an aperture including a negative angle, such that a layer can be deposited over the liftoff mask layer and the mask layer removed, leaving a structure having tapered edges.