The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2010
Filed:
Feb. 21, 2006
Krishna Vepa, Sunnyvale, CA (US);
Yashraj Bhatnagar, Santa Clara, CA (US);
Ronald Rayandayan, Union City, CA (US);
Venkata Balagani, Gilroy, CA (US);
Krishna Vepa, Sunnyvale, CA (US);
Yashraj Bhatnagar, Santa Clara, CA (US);
Ronald Rayandayan, Union City, CA (US);
Venkata Balagani, Gilroy, CA (US);
Applied Materials, Inc., Santa Clara, CA (US);
Abstract
A method of treating a substrate comprises depositing silicon oxycarbide on the substrate and removing the silicon oxycarbide from the substrate. The silicon oxycarbide on the substrate is decarbonized by exposure to an energized oxygen-containing gas that heats the substrate and converts the layer of silicon oxycarbide into a layer of silicon oxide. The silicon oxide is removed by exposure to a plasma of fluorine-containing process gas. Alternatively, the remaining silicon oxide can be removed by a fluorine-containing acidic bath. In yet another version, a plasma of a fluorine-containing gas and an oxygen-containing gas is energized to remove the silicon oxycarbide from the substrate.