The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 09, 2010
Filed:
Aug. 31, 2005
Applicant:
Yuji Setta, Kawasaki, JP;
Inventor:
Yuji Setta, Kawasaki, JP;
Assignee:
Fujitsu Microelectronics Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure mask, includes a quartz (transparent) substrate, a filmformed on the quartz substrate, a rectangular main featureformed in the film, a first assist featureformed in the filmaway from the main featureand having a size that is not resolved as a rectangle that has a long sideopposing to one sideof the main feature, and a second assist featureformed in the filmand positioned on a virtual prolonged line L of a diagonal of the main featureand having a size that is not resolved.
Setta, Yuji. (2010). Exposure mask and method of manufacturing the same, and semiconductor device manufacturing method (U.S. Patent No. 7659040). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7659040
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile