The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 09, 2010

Filed:

Jul. 20, 2004
Applicants:

Masahiko Ishida, Tokyo, JP;

Hiroo Hongo, Tokyo, JP;

Jun-ichi Fujita, Tokyo, JP;

Inventors:

Masahiko Ishida, Tokyo, JP;

Hiroo Hongo, Tokyo, JP;

Jun-ichi Fujita, Tokyo, JP;

Assignee:

NEC Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C30B 25/12 (2006.01);
U.S. Cl.
CPC ...
Abstract

A metal fine particle is adhere to a predetermined location on a substrate. A resist film containing a metallic compound dispersed therein is formed on a substrate (). A patterning of the resist film is conducted by a lithography. The substrate () having the patterned resist formed thereon is heated within an oxygen atmosphere to adhere a metal fine particle () to the surface of the substrate (), while removing the resin in the patterned resist.


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