The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Jan. 20, 1995
Applicant:
Naomasa Shiraishi, Urawa, JP;
Inventor:
Naomasa Shiraishi, Urawa, JP;
Assignee:
Nikon Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03B 27/42 (2006.01); G03B 27/72 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure system is provided for illuminating a fine pattern that may have features extending along orthogonal first and second linear directions. An illumination source may be provided having decreased intensity portions at a center and defined along the first and second directions.
Quick Actions:
Shiraishi, Naomasa. (2010). Projection exposure apparatus with luminous flux distribution (U.S. Patent No. 7656504). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7656504
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