The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 7656503 B1

PDF
Full Text
Expired
Date of Patent:
Feb. 02, 2010

Filed:

Mar. 09, 2007
Applicant:

Seiya Miura, Utsunomiya, JP;

Inventor:

Seiya Miura, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract

An exposure apparatus including an illumination optical system to illuminate an original with exposure light of plural wavelengths, a projection optical system to project an image of a pattern of the original onto a substrate, an original-side reference pattern provided at an original side of the projection optical system, a substrate-side reference pattern provided at a substrate side of the projection optical system, and an image plane detecting system configured so that the original-side reference pattern is illuminated with the exposure light or light equivalent to the exposure light with respect to a wavelength component rate.


Find Patent Forward Citations

Miura, Seiya. (2010). Exposure apparatus and image plane detecting method (U.S. Patent No. 7656503). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7656503

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…