The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Mar. 09, 2007
Applicant:
Seiya Miura, Utsunomiya, JP;
Inventor:
Seiya Miura, Utsunomiya, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01);
U.S. Cl.
CPC ...
Abstract
An exposure apparatus including an illumination optical system to illuminate an original with exposure light of plural wavelengths, a projection optical system to project an image of a pattern of the original onto a substrate, an original-side reference pattern provided at an original side of the projection optical system, a substrate-side reference pattern provided at a substrate side of the projection optical system, and an image plane detecting system configured so that the original-side reference pattern is illuminated with the exposure light or light equivalent to the exposure light with respect to a wavelength component rate.