The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
May. 02, 2007
Mike Musgrave, Houston, TX (US);
Mike Musgrave, Houston, TX (US);
Fina Technology, Inc., Houston, TX (US);
Abstract
A polypropylene material is provided having increased radiation resistance compared to solely isotactic polypropylene. The material is formed by utilizing a syndiotactic polypropylene. The isotactic polypropylene may be an isotactic metallocene or Ziegler-Natta catalyzed polypropylene and may include an amount of syndiotactic polypropylene. The material may be used in forming a variety of materials that may undergo exposure to radiation, such as sterilization procedures using radiation. It is emphasized that this abstract is provided to comply with the rules requiring an abstract which will allow a searcher or other reader to quickly ascertain the subject matter of the technical disclosure. It is submitted with the understanding that it will not be used to interpret or limit the scope or meaning of the claims.