The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Aug. 29, 2006
Applicants:
Sung Koo Lee, Seoul, KR;
Jae Chang Jung, Seoul, KR;
Inventors:
Sung Koo Lee, Seoul, KR;
Jae Chang Jung, Seoul, KR;
Assignee:
Hynix Semiconductor Inc., Icheon-si, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract
Disclosed herein is a method for manufacturing a semiconductor device that includes performing an Oplasma treatment step after forming a Si-containing photoresist film.
Lee, Sung. (2010). Method for manufacturing underlying pattern of semiconductor device (U.S. Patent No. 7655568). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/7655568
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile