The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 02, 2010
Filed:
Aug. 24, 2006
Petra Mela, Aachen, DE;
Marcell Ott, Stuttgart, DE;
Joachim Spatz, Herdenheim, DE;
Blazej Gorzolnik, Aachen, DE;
Martin Möller, Aachen, DE;
Petra Mela, Aachen, DE;
Marcell Ott, Stuttgart, DE;
Joachim Spatz, Herdenheim, DE;
Blazej Gorzolnik, Aachen, DE;
Martin Möller, Aachen, DE;
DWI an der RWTH, , DE;
Abstract
The present invention relates to a photochemical method for manufacturing nanometrically surface-decorated substrates, i.e. the creation of periodic and aperiodic patterns of highly ordered inorganic nanostructures on a substrate. This method is based on the selective photochemical modification of a self-assembled monolayer of metal compound loaded polymer core-shell systems on widely variable substrates. Light exposure through an appropriate mask causes selective chemical modification of the polymer core shell system. By subsequently placing the substrate in an appropriate chemical solution that eradicates the non-modified polymer, the pattern given by the used mask is reproduced on the surface. Finally, the remaining organic matrix is removed and metal salt is transformed to the single metal or metal oxide nanodots by means of gas plasma treatment.