The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2010
Filed:
Mar. 03, 2006
Alfred Hero, Ann Arbor, MI (US);
Huzefa Neemuchwala, Mountain View, CA (US);
Paul Carson, Ann Arbor, MI (US);
Charles Raymond Meyer, Ann Arbor, MI (US);
Alfred Hero, Ann Arbor, MI (US);
Huzefa Neemuchwala, Mountain View, CA (US);
Paul Carson, Ann Arbor, MI (US);
Charles Raymond Meyer, Ann Arbor, MI (US);
The Regents of the University of Michigan, Ann Arbor, MI (US);
Abstract
A method determines alignment of images in high dimensional feature space. The method comprises registering a source image of a reference modality to a target image of a second modality with an algorithm based upon a measure of information affinity present in both of the source and target image to create a registered image. Next, a plurality of feature vector are extracted from the registered image for each of the source and target images and attributes of the joint distribution of feature vector are captured using an entropic graph spanning the features. Edge lengths are between proximal feature vectors are extracted from the entropic graph and a similarity measure of one of an α-divergence estimate or an α-affinity estimate is constructed based upon these edge lengths to quantify whether the source and target image are sufficiently registered.