The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2010

Filed:

May. 09, 2007
Applicants:

Steven R. Carlo, Monroe, NY (US);

Eva M. Maya, Madrid, ES;

Arthur W. Snow, Alexandria, VA (US);

Richard G. S. Pong, Silver Spring, MD (US);

Inventors:

Steven R. Carlo, Monroe, NY (US);

Eva M. Maya, Madrid, ES;

Arthur W. Snow, Alexandria, VA (US);

Richard G. S. Pong, Silver Spring, MD (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08K 5/16 (2006.01);
U.S. Cl.
CPC ...
Abstract

High concentrations of dye may be prepared in combination with thermoplastic polymers and used in optical polymers as monomeric and dimeric molecular solutions. The method of preparing high concentration levels allows the control over the aggregation of dye molecules that is required to maintain effective nonlinear operation. The present invention is applicable to many systems and is essential to the successful production of working optical limiting devices and other optically transparent polymeric devices, as well as other photonic applications, such as nonlinear optics.


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