The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 26, 2010
Filed:
May. 13, 2004
Paulus Cornelis Duineveld, Eindhoven, NL;
Gerwin Hermanus Gelinck, Eindhoven, NL;
Paulus Cornelis Duineveld, Eindhoven, NL;
Gerwin Hermanus Gelinck, Eindhoven, NL;
Polymer Vision Limited, Eindhoven, NL;
Abstract
The invention relates to a structure for a semiconductor arrangement. A resist structure for supporting deposition of a solution containing a semiconductor is directly or through intervening layers coupled to a substrate. The resist structure comprises a depression () for depositing of the solution containing the semiconductor () and a trough () aligning at least part of an edge of the depression () and separated from the depression () by a protrusion (). The trough () preferably surrounds the depression (). The trough provides a pinning effect on the solution containing the semiconductor thereby improving the wettability and accordingly allowing for increased volume of semiconductor to be applied to a given area.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile