The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 26, 2010

Filed:

Mar. 26, 2008
Applicants:

John E. Knaub, Etters, PA (US);

Lynn Robert Sipe, Mifflintown, PA (US);

David W. Helster, Dauphin, PA (US);

Timothy R. Minnick, Enola, PA (US);

Douglas W. Glover, Dauphin, PA (US);

Inventors:

John E. Knaub, Etters, PA (US);

Lynn Robert Sipe, Mifflintown, PA (US);

David W. Helster, Dauphin, PA (US);

Timothy R. Minnick, Enola, PA (US);

Douglas W. Glover, Dauphin, PA (US);

Assignee:

Tyco Electronics Corporation, Berwyn, PA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01R 13/648 (2006.01);
U.S. Cl.
CPC ...
Abstract

An electrical connector includes a housing defining a connector mating interface. The housing holds a plurality of contact modules that cooperate to define a connector mounting interface. Each contact module contains signal leads and ground leads arranged in an alternating pattern of individual ground leads and pairs of signal leads positioned side-by-side with respect to a thickness of the contact module. The signal and ground leads have respective mating contacts proximate the mating interface and respective mounting contacts proximate the mounting interface. The mating and mounting contacts within each contact module are arranged in one of first and second contact patterns different from the pattern of the signal and ground leads. The mating and mounting contacts in adjacent contact modules are arranged in respective different ones of the first and second contact patterns.


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