The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Dec. 12, 2008
Robert J. Baseman, Brewster, NY (US);
Fateh A. Tipu, Wappingers Falls, NY (US);
Sholom M. Weiss, New York, NY (US);
Robert J. Baseman, Brewster, NY (US);
Fateh A. Tipu, Wappingers Falls, NY (US);
Sholom M. Weiss, New York, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A fabrication history a group of wafers is provided, having a record for each wafer of the manufacturing events that did or did not occur in its fabrication, and having the measured value of a given target. A binary decision rule is formed based on the fabrication history, the rule being that if a wafer has a particular pattern of manufacturing events in its fabrication history then the statistic of the given fabrication target for that wafer is a first value; otherwise, the statistic is a second value having at least a given distance from the first value. The pattern of manufacturing events in the binary decision rule is identified in the generation of the binary decision rule. The identified pattern is significant with respect to the given target.