The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Feb. 23, 2007
Daisuke Baba, Mishima, JP;
Masahiro Yoshida, Tokyo, JP;
Daisuke Baba, Mishima, JP;
Masahiro Yoshida, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
A developing apparatus includes: a developing sleeve that carries a mono-component developer; and a developing blade that abuts on the sleeve to regulate a layer thickness of the developer on the sleeve, wherein surface roughness parameters of the sleeve satisfy: 3.0≦Rpk≦9.0; and 2≦Pc≦10. At an abutment portion between the sleeve and the blade, surface roughness parameters of the blade satisfy: 0.030≦Sm≦0.170; and 0.10≦Rvk×(100−Mr)/100≦1.30, where Sm is a mean spacing of profile irregularities [mm]; Rpk is an initial wear height [μm]; Rvk is an oil retaining depth [μm]; Mris a profile bearing length ratio 2 [%]; and Pcdenotes the number of profile peaks having a height larger than a count level from a center line per the evaluation length of 1 mm.