The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Feb. 06, 2006
Applicants:
Mark Wagner, Raleigh, NC (US);
James Deyoung, Durham, NC (US);
Inventors:
Mark Wagner, Raleigh, NC (US);
James DeYoung, Durham, NC (US);
Assignee:
MiCell Technologies, Inc., Raleigh, NC (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/00 (2006.01); G03C 1/00 (2006.01);
U.S. Cl.
CPC ...
Abstract
Methods for carrying out lithography with a carbon dioxide development system are described. This invention involves methods for preferential removal of the darkfield region of conventional chemically amplified positive tone resists. The carbon dioxide development systems include one or more derivatizing agents, which may be an onium salt or a neutral compound.