The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
May. 17, 2005
Kelvin Nguyen, Rochester, NY (US);
Zhihao Yang, Webster, NY (US);
Kelvin Nguyen, Rochester, NY (US);
Zhihao Yang, Webster, NY (US);
Eastman Kodak Company, Rochester, NY (US);
Abstract
A method of forming a pattern of electrical conductors on a receiving substrate () comprises forming metal nanoparticles of a conductive material. A donor substrate () is formed. A layer of release material () is deposited on a first side of the donor substrate. The metal nanoparticles are deposited on the release material. The metal nanoparticulate layer are placed in contact with the receiving substrate. A pattern is written on a sandwich formed by the donor substrate and the receiving substrate, causing metal nanoparticles from the nanoparticulate layer () to anneal and transfer to the receiving substrate to form the pattern of electrical conductors on the receiving substrate.