The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 19, 2010
Filed:
Oct. 02, 2008
Matthias Bauer, Phoenix, AZ (US);
Keith Doran Weeks, Gilbert, AZ (US);
Pierre Tomasini, Tempe, AZ (US);
Nyles Cody, Tempe, AZ (US);
Matthias Bauer, Phoenix, AZ (US);
Keith Doran Weeks, Gilbert, AZ (US);
Pierre Tomasini, Tempe, AZ (US);
Nyles Cody, Tempe, AZ (US);
ASM America Inc., Phoenix, AZ (US);
Abstract
Methods of making Si-containing films that contain relatively high levels of substitutional dopants involve chemical vapor deposition using trisilane and a dopant precursor. Extremely high levels of substitutional incorporation may be obtained, including crystalline silicon films that contain 2.4 atomic % or greater substitutional carbon. Substitutionally doped Si-containing films may be selectively deposited onto the crystalline surfaces of mixed substrates by introducing an etchant gas during deposition.